Ion Beam Sputtering (IBS)
Ion Beam Sputtering (IBS) or Ion Beam Deposition (IBD) is a Physical Vapour Deposition (PVD) technique when the layer of a desired material is formed by molecules extracted from the target material by a highly energetic and precisely controlled ion beam.
The key principle lies in the mechanism of extracting molecules from the target material. The possibility of material sputtering is very much enabled by ion grid optics that can precisely control ion energy and beam focus. When the proper energy of ions is chosen to minimise ion implantation (typically 1000-2000eV), they are precisely directed to the target material, and desired atoms or molecules are knocked out from their stable positions by multiple collisions and can leave the target. Such interaction between ion beam and the target is called sputtering.
Utilising this, an optical interference coating is created by stacking layers of different materials and precisely controlling the thickness of each layer. Coatings produced by the Ion Beam Sputtering method are proven to meet the most demanding industry and scientific requirements and provide numerous benefits for laser and laser systems manufacturers.

Ion Beam Sputtering (IBS) Family
OPTOMAN employs 5 IBS machines to ensure the best fit for each coating run.
Send us a
message!
Relax and build your laser. OPTOMAN
has your back.
Thank you
for your request
We will contact you as soon as possible